ALEXANDRIA, Va., July 16 -- United States Patent no. 12,669,757, issued on June 30.
"Mask inspection apparatus with a platform module" was invented by Ming-Sheng Chen (New Taipei City, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A mask inspection machine includes a platform unit for carrying a transparent container. The transparent container includes a lower window and an upper window. The platform unit includes a platform and a carrier. The platform includes a slot. The carrier is movable on the platform along the slot. The carrier includes a plate and guiding elements. The plate includes a support face including an inspection window corresponding to the lower window of the transparent container. ...