US Patent Issued on July 14 for "Composition for etching and method for manufacturing semiconductor device using same" (South Korean Inventors)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,680,022, issued on July 14.

"Composition for etching and method for manufacturing semiconductor device using same" was invented by Jung Hun Lim (Daejeon, South Korea), Jin Uk Lee (Daejeon, South Korea) and Jae Wan Park (Daegu, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A composition for etching and a method of manufacturing a semiconductor device, the method including an etching process of using the composition for etching, are provided. The composition for etching includes a first inorganic acid; any one first additive selected from the group consisting of phosphorous acid, an organic phosphite, a hypophosphite, and mixtures thereof; an...