US Patent Issued on Jan. 27 for "Stencil mask and stencil printing method" (South Korean Inventors)

ALEXANDRIA, Va., Jan. 28 -- United States Patent no. 12,538,433, issued on Jan. 27.

"Stencil mask and stencil printing method" was invented by KyoWang Koo (Incheon, South Korea), KiCheol Lee (Incheon, South Korea) and BoLee Lim (Incheon, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A stencil mask and a stencil printing method are provided. The stencil mask includes: a non-reinforcement portion having a mask surface configured to contact a substrate surface of a substrate; and a reinforcement portion having a thickness greater than that of the non-reinforcement portion, wherein the reinforcement portion includes: an embossed surface for insertion into a cavity of the substrate and configured to ...