US Patent Issued on Feb. 17 for "Selective stencil mask and a stencil printing method" (South Korean Inventors)

ALEXANDRIA, Va., Feb. 17 -- United States Patent no. 12,552,192, issued on Feb. 17.

"Selective stencil mask and a stencil printing method" was invented by HyunSeok Park (Gyeonggi-do, South Korea), KyoWang Koo (Incheon, South Korea), SeongKuk Kim (Gyeonggi-do, South Korea) and SeokBeom Heo (Incheon, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A selective stencil mask and a stencil printing method are provided. The stencil mask is for printing a fluid material onto a substrate, and comprises: a stencil member comprising: at least one printing region each having an array of apertures that allow the fluid material to flow therethrough and deposit onto the substrate; and a blocking region configure...