ALEXANDRIA, Va., April 15 -- United States Patent no. 12,604,697, issued on April 14.
"Waste gas treatment apparatus for semiconductor and display processes" was invented by Chul Hwan Kim (Pyeongtaek-si, South Korea), Dong Soo Kim (Anseong-si, South Korea), Hyun Kyung Kim (Pyeongtaek-si, South Korea), Kang Sik Shin (Pyeongtaek-si, South Korea) and Yeo Jin Kim (Anseong-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed is a waste gas treatment apparatus for semiconductor and display processes, the apparatus including: a pre-treatment unit having an inlet and an outlet formed therein, and configured to spray a cleaning solution to waste gas introduced through the inlet to primarily treat ...