SCHUMER CELEBRATES ARRIVAL OF CUTTING-EDGE EXTREME ULTRAVIOLET LITHOGRAPHY (EUV) CHIP-MAKING TECHNOLOGY COMPONENTS TO ALBANY NANOTECH, MAKING CAPITAL REGION HOME TO THE ONLY PUBLIC ADVANCED EUV LAB IN NORTH AMERICA

WASHINGTON, July 21 -- Sen. Chuck Schumer issued the following press release:

Following years of relentless advocacy for the Capital Region, U.S. Senator Chuck Schumer today applauded the arrival of the first major components of the world's most advanced High Numerical Aperture Extreme Ultraviolet (High NA EUV) lithography system at Albany NanoTech that will drive new, cutting-edge research and development (R&D) at New York Creates' High NA EUV Lithography Center. The new center will make the Capital Region home to the only public facility with access to the advanced High NA EUV machine in North America. Schumer said this is a major milestone in establishing Upstate New York as the heart of America's semiconductor research and manufacturin...