INTERNATIONAL PATENT: ZHEJIANG JITANG TECHNOLOGY CO., LTD, 浙江纪堂科技有限公司 FILES APPLICATION FOR "ALKALINE ETCHING ADDITIVE, ALKALINE ETCHING SOLUTION AND METHOD FOR CLEANING WRAP-AROUND POLYCRYSTALLINE SILICON"

GENEVA, Feb. 20 -- ZHEJIANG JITANG TECHNOLOGY CO., LTD (Building 2, Science And Technology Oasis, No. 8 Haining Avenue, Haining CityJiaxing, Zhejiang 314400), 浙江纪堂科技有限公司 (中国浙江省嘉兴市海宁市海宁大道8号科技绿洲2号楼) filed a patent application (PCT/CN2024/113802) for "ALKALINE ETCHING ADDITIVE, ALKALINE ETCHING SOLUTION, AND METHOD FOR CLEANING WRAP-AROUND POLYCRYSTALLINE SILICON" on Aug 22, 2024. With publication no. WO/2026/036422, the details related to the patent application was published on Feb 19, 2026.

Notably, the patent applicatio...