INTERNATIONAL PATENT: VERSUM MATERIALS US, LLC FILES APPLICATION FOR "CMP FORMULATIONS AND METHODS FOR POLISHING POLYSILICON FILMS"

GENEVA, June 4 -- VERSUM MATERIALS US, LLC (8555 SOUTH RIVER PARKWAYTEMPE, Arizona 85284) filed a patent application (PCT/US2024/056346) for "CMP FORMULATIONS AND METHODS FOR POLISHING POLYSILICON FILMS" on Nov 18, 2024. With publication no. WO/2025/111218, the details related to the patent application was published on May 30, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): HWANG, Hee Min (C/O VERSUM MATERIALS US, LLC8555 SOUTH RIVER PARKWAYTEMPE, Arizona 85284), TAMBOLI, Dnyanesh (C/O VERSUM MATERIALS US, LLC8555 SOUTH RIVER PARKWAYTEMPE, Arizona 85284), YU, Jeong-yun (C/O VERSUM MATERIALS ...