International Patent: VALVE CALIBRATION METHOD, SUBSTRATE PROCESSING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, PROGRAM, AND PROCESSING DEVICE

GENEVA, Oct. 22 -- KOKUSAI ELECTRIC CORPORATION filed a patent application (JP2025/014795) for “VALVE CALIBRATION METHOD, SUBSTRATE PROCESSING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, PROGRAM, AND PROCESSING DEVICE”. With publication no. WO/2026/220501, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: F16K 24/04

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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