INTERNATIONAL PATENT: TSINGHUA UNIVERSITY, 清华大学 FILES APPLICATION FOR "MANUFACTURING METHOD FOR HIGH-ASPECT-RATIO X-RAY GRATING AND HIGH-ASPECT-RATIO X-RAY GRATING"

GENEVA, Oct. 12 -- TSINGHUA UNIVERSITY (No. 1 Tsinghua YuanHaidian District, Beijing 100084), 清华大学 (中国北京市海淀区清华园1号) filed a patent application (PCT/CN2024/092400) for "MANUFACTURING METHOD FOR HIGH-ASPECT-RATIO X-RAY GRATING, AND HIGH-ASPECT-RATIO X-RAY GRATING" on May 10, 2024. With publication no. WO/2025/208690, the details related to the patent application was published on Oct 09, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): WANG, Zhentian (No. 1 Tsinghua YuanHaidian District...