INTERNATIONAL PATENT: TOKYO ELECTRON LIMITED, TOKYO ELECTRON U.S. HOLDINGS, INC. FILES APPLICATION FOR "SYSTEMS AND LOW TEMPERATURE METHODS OF FORMING FERROELECTRIC DEVICE ELECTRODES"

GENEVA, March 3 -- TOKYO ELECTRON LIMITED (3-1 Akasaka 5-chome, Minato-kuTokyo, 107-6325), TOKYO ELECTRON U.S. HOLDINGS, INC. (401 S 1st St, Suite 900Austin, Texas 78704) filed a patent application (PCT/US2025/042183) for "SYSTEMS AND LOW TEMPERATURE METHODS OF FORMING FERROELECTRIC DEVICE ELECTRODES" on Aug 15, 2025. With publication no. WO/2026/043736, the details related to the patent application was published on Feb 26, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): TRIYOSO, Dina H. (NanoFab 300 South 255 Fuller Rd., Suite 214Albany, New York 12203), LEE, Tek Po Rinus (NanoFab 300 South...