INTERNATIONAL PATENT: TOKYO ELECTRON LIMITED, TOKYO ELECTRON U.S. HOLDINGS, INC. FILES APPLICATION FOR "MASK MODIFICATION METHOD"

GENEVA, April 14 -- TOKYO ELECTRON LIMITED (3-1 Akasaka 5-chome, Minato-kuTokyo, 107-6325), TOKYO ELECTRON U.S. HOLDINGS, INC. (401 S 1st St, Suite 900Austin, Texas 78704) filed a patent application (PCT/US2025/033877) for "MASK MODIFICATION METHOD" on Jun 17, 2025. With publication no. WO/2026/075701, the details related to the patent application was published on Apr 09, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): PARK, Minjoon (NanoFab 300 South 255 Fuller Rd., Suite 214Albany, New York 12203)

Abstract: A method for processing a substrate includes receiving the substrate on a substrat...