INTERNATIONAL PATENT: TOKYO ELECTRON LIMITED, TOKYO ELECTRON U.S. HOLDINGS, INC. FILES APPLICATION FOR "INHIBITOR-FREE GAPFILL PROCESS METHOD AND HARDWARE"

GENEVA, April 20 -- TOKYO ELECTRON LIMITED (3-1 Akasaka 5-chome, Minato-kuTokyo, 107-6325), TOKYO ELECTRON U.S. HOLDINGS, INC. (401 S 1st St, Suite 900Austin, Texas 78704) filed a patent application (PCT/US2025/040257) for "INHIBITOR-FREE GAPFILL PROCESS METHOD AND HARDWARE" on Aug 01, 2025. With publication no. WO/2026/080131, the details related to the patent application was published on Apr 16, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): ZHAO, Jianping (401 S 1st St, Suite 900Austin, Texas 78704)

Abstract: Aspects of the present disclosure provide an inhibitor-free method for filling...