INTERNATIONAL PATENT: TOKYO ELECTRON LIMITED, TOKYO ELECTRON U.S. HOLDINGS, INC. FILES APPLICATION FOR "CHEMICAL ETCH USING SELECTIVE ION IMPLANTATION"

GENEVA, Jan. 20 -- TOKYO ELECTRON LIMITED (3-1 Akasaka 5-chome, Minato-kuTokyo, 107-6325), TOKYO ELECTRON U.S. HOLDINGS, INC. (401 S 1st St, Suite 900Austin, Texas 78704) filed a patent application (PCT/US2025/027950) for "CHEMICAL ETCH USING SELECTIVE ION IMPLANTATION" on May 06, 2025. With publication no. WO/2026/015192, the details related to the patent application was published on Jan 15, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): KO, Akiteru (NanoFab 300 South 255 Fuller Rd., Suite 214Albany, New York 12203)

Abstract: A method of chemically etching an underlying material includes ...