INTERNATIONAL PATENT: TOKYO ELECTRON LIMITED, TOKYO ELECTRON U.S. HOLDINGS, INC., INTERNATIONAL BUSINESS MACHINES CORPORATION FILES APPLICATION FOR "PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION METHOD"

GENEVA, March 31 -- TOKYO ELECTRON LIMITED (3-1 Akasaka 5-chome, Minato-kuTokyo, 107-6325), TOKYO ELECTRON U.S. HOLDINGS, INC. (401 S 1st St, Suite 900Austin, Texas 78704), INTERNATIONAL BUSINESS MACHINES CORPORATION (1 Orchard RoadArmonk, New York 10504) filed a patent application (PCT/US2025/029081) for "PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION METHOD" on May 13, 2025. With publication no. WO/2026/063977, the details related to the patent application was published on Mar 26, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): KOTY, Devi (NanoFab 300 South 255 Fuller Rd., Suite 214Albany, New ...