INTERNATIONAL PATENT: TOKYO ELECTRON LIMITED, 東京エレクトロン株式会社 FILES APPLICATION FOR "METHOD FOR FORMING METAL-CONTAINING FILM, METHOD FOR MANUFACTURING CAPACITOR AND FILM FORMING DEVICE"

GENEVA, April 13 -- TOKYO ELECTRON LIMITED (3-1, Akasaka 5-chome, Minato-ku, Tokyo1076325), 東京エレクトロン株式会社 (東京都港区赤坂五丁目３番１号) filed a patent application (PCT/JP2024/035331) for "METHOD FOR FORMING METAL-CONTAINING FILM, METHOD FOR MANUFACTURING CAPACITOR, AND FILM FORMING DEVICE" on Oct 02, 2024. With publication no. WO/2026/074659, the details related to the patent application was published on Apr 09, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property O...