INTERNATIONAL PATENT: TOKYO ELECTRON LIMITED, 東京エレクトロン株式会社, NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY, 国立研究開発法人産業技術総合研究所 FILES APPLICATION FOR "METHOD FOR FORMING TRANSITION METAL DICHALCOGENIDE FILM"

Posted On: 2026-05-11

GENEVA, May 11 -- TOKYO ELECTRON LIMITED (3-1 Akasaka 5-chome, Minato-ku, Tokyo1076325), 東京エレクトロン株式会社 (東京都港区赤坂五丁目３番１号), NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (3-1, Kasumigaseki 1-chome, Chiyoda-ku, Tokyo1008921), 国立研究開発法人産業技術総合研究所 (東京都千代田区霞が関１－３－１) filed a patent application (PCT/JP2025/036447) for "METHOD FOR FORMI...

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INTERNATIONAL PATENT: TOKYO ELECTRON LIMITED, 東京エレクトロン株式会社, NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY, 国立研究開発法人産業技術総合研究所 FILES APPLICATION FOR "METHOD FOR FORMING TRANSITION METAL DICHALCOGENIDE FILM"