INTERNATIONAL PATENT: TOKUYAMA CORPORATION, 株式会社トクヤマ FILES APPLICATION FOR "SEMICONDUCTOR PROCESSING LIQUID, PROCESSING METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE"

GENEVA, April 28 -- TOKUYAMA CORPORATION (1-1, Mikage-cho, Shunan-shi, Yamaguchi7458648), 株式会社トクヤマ (山口県周南市御影町１番１号) filed a patent application (PCT/JP2025/036209) for "SEMICONDUCTOR PROCESSING LIQUID, PROCESSING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE" on Oct 14, 2025. With publication no. WO/2026/083966, the details related to the patent application was published on Apr 23, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): SUZUK...