INTERNATIONAL PATENT: TOKUYAMA CORPORATION, 株式会社トクヤマ FILES APPLICATION FOR "METHOD FOR MIXING ETCHING SOLUTION FOR POLYCRYSTALLINE SILICON, METHOD FOR PRODUCING POLYCRYSTALLINE SILICON AND APPARATUS FOR CLEANING POLYCRYSTALLINE SILICON"

GENEVA, April 19 -- TOKUYAMA CORPORATION (1-1, Mikage-cho, Shunan-shi, Yamaguchi7458648), 株式会社トクヤマ (山口県周南市御影町１番１号) filed a patent application (PCT/JP2024/043151) for "METHOD FOR MIXING ETCHING SOLUTION FOR POLYCRYSTALLINE SILICON, METHOD FOR PRODUCING POLYCRYSTALLINE SILICON, AND APPARATUS FOR CLEANING POLYCRYSTALLINE SILICON" on Dec 06, 2024. With publication no. WO/2026/078895, the details related to the patent application was published on Apr 16, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intell...