GENEVA, April 19 -- TOAGOSEI CO., LTD. (1-14-1, Nishi-Shimbashi, Minato-ku, Tokyo1058419), 東亞合成株式会社 (東京都港区西新橋１丁目１４番１号) filed a patent application (PCT/JP2025/034818) for "SILOXANE COMPOUND, STRUCTURE WITH COATING LAYER, COMPOSITION FOR FORMING VAPOR DEPOSITION FILM, VAPOR DEPOSITION FILM, CURED PRODUCT, AND METHOD FOR PRODUCING STRUCTURE WITH COATING LAYER" on Sep 30, 2025. With publication no. WO/2026/079244, the details related to the patent application was published on Apr 16, 2026.
Notably, the patent application was submitted under the International Patent Classificatio...