GENEVA, July 29 -- THE SCHOOL CORPORATION KANSAI UNIVERSITY (3-35, Yamate-cho 3-chome, Suita-shi, Osaka5648680), 学校法人　関西大学 (大阪府吹田市山手町３丁目３番３５号), MITSUBISHI GAS CHEMICAL COMPANY, INC. (5-2, Marunouchi 2-chome, Chiyoda-ku, Tokyo1008324), 三菱瓦斯化学株式会社 (東京都千代田区丸の内二丁目５番２号) filed a patent application (PCT/JP2025/000446) for "COMPOSITION FOR FORMING LITHOGRAPHY UNDERLAYER FILM, LITHOGRA...