INTERNATIONAL PATENT: THE HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY FILES APPLICATION FOR "GERMANIUM ION-IMPLANTED SILICON WAVEGUIDE PHOTODIODE AND METHOD FOR MANUFACTURING THE SAME"

GENEVA, April 13 -- THE HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY (Clear Water Bay, KowloonHong Kong) filed a patent application (PCT/CN2025/113142) for "GERMANIUM ION-IMPLANTED SILICON WAVEGUIDE PHOTODIODE AND METHOD FOR MANUFACTURING THE SAME" on Aug 07, 2025. With publication no. WO/2026/073482, the details related to the patent application was published on Apr 09, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): NIU, Yue (The Hong Kong University of Science and Technology,Clear Water Bay, KowloonHong Kong), ZHANG, Qianni (The Hong Kong University of Science and Technology,Clear Water...