International Patent: SYSTEMS AND METHODS FOR IMPROVED IMPLICIT COMPUTER AIDED DESIGN (CAD)

GENEVA, Aug. 14 -- NTOPOLOGY INC. filed a patent application (US2025/039246) for “SYSTEMS AND METHODS FOR IMPROVED IMPLICIT COMPUTER AIDED DESIGN (CAD)”. With publication no. WO/2026/169281, here are the other details related to the patent application:

Kind: Initial Publication without ISR [A2]

IPC: G06F 30/20

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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