GENEVA, Aug. 7 -- HITACHI, LTD. filed a patent application (JP2025/038988) for “SYSTEM FOR DESIGNING SPECIFICATION FOR GAS SEPARATION DEVICE, METHOD FOR DESIGNING SPECIFICATION FOR GAS SEPARATION DEVICE, AND PROGRAM”. With publication no. WO/2026/163553, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: B01D 53/22
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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