International Patent: SUBSTRATE WITH CONDUCTIVE FILM, REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD

GENEVA, Aug. 7 -- HOYA CORPORATION filed a patent application (JP2026/003035) for “SUBSTRATE WITH CONDUCTIVE FILM, REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD”. With publication no. WO/2026/164206, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: G03F 1/24

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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