GENEVA, June 26 -- TOKYO ELECTRON LIMITED filed a patent application (JP2025/038103) for “SUBSTRATE PROCESSING METHOD”. With publication no. WO/2026/120948, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: G03F 7/40
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Disclaimer: Curated by HT Syndication....