GENEVA, Oct. 30 -- TOKYO ELECTRON LIMITED filed a patent application (JP2026/014979) for “SUBSTRATE PROCESSING METHOD AND PROGRAM”. With publication no. WO/2026/225349, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: H10P 50/60
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Disclaimer: Curated by HT Syndication....