International Patent: SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING SYSTEM, AND PROGRAM

GENEVA, Oct. 30 -- TOKYO ELECTRON LIMITED filed a patent application (JP2025/015787) for “SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING SYSTEM, AND PROGRAM”. With publication no. WO/2026/224845, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: H01L 21/304

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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