International Patent: SUBSTRATE PROCESSING METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, PROGRAM, AND SUBSTRATE PROCESSING DEVICE

GENEVA, July 6 -- KOKUSAI ELECTRIC CORPORATION filed a patent application (JP2025/033134) for “SUBSTRATE PROCESSING METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, PROGRAM, AND SUBSTRATE PROCESSING DEVICE”. With publication no. WO/2026/140390, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: H01L 21/316

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Disclaimer: Curated by HT Syndication....