International Patent: SUBSTRATE PROCESSING DEVICE, IRRADIATION UNIT, SUBSTRATE PROCESSING METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND PROGRAM

GENEVA, Aug. 7 -- KOKUSAI ELECTRIC CORPORATION filed a patent application (JP2025/039103) for “SUBSTRATE PROCESSING DEVICE, IRRADIATION UNIT, SUBSTRATE PROCESSING METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND PROGRAM”. With publication no. WO/2026/163557, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: H10P 14/60

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Disclaimer: Curated by HT Syndication....