GENEVA, Oct. 22 -- KOKUSAI ELECTRIC CORPORATION filed a patent application (JP2025/014831) for “SUBSTRATE PROCESSING DEVICE, CALIBRATION METHOD FOR SUBSTRATE PROCESSING DEVICE, PROCESSING METHOD FOR SUBSTRATE, MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE, AND CALIBRATION PROGRAM FOR SUBSTRATE PROCESSING DEVICE”. With publication no. WO/2026/220508, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: H01L 21/31
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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