GENEVA, July 2 -- NISSIN ELECTRIC CO., LTD. filed a patent application (JP2025/037403) for “SPUTTERING TARGET, SPUTTERING APPARATUS, AND SPUTTERING FILM FORMATION METHOD”. With publication no. WO/2026/133729, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: C23C 14/34
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Disclaimer: Curated by HT Syndication....