INTERNATIONAL PATENT: SOITEC FILES APPLICATION FOR "METHOD FOR PRODUCING A SILICON SUBSTRATE FOR QUANTUM APPLICATIONS"

GENEVA, Feb. 9 -- SOITEC (PARC TECHNOLOGIQUES DES FONTAINESCHEMIN DES FRANQUES38190 BERNIN) filed a patent application (PCT/EP2025/071820) for "METHOD FOR PRODUCING A SILICON SUBSTRATE FOR QUANTUM APPLICATIONS" on Jul 29, 2025. With publication no. WO/2026/027555, the details related to the patent application was published on Feb 05, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): RODA NEVE, Cesar (C/O SOITECPARC TECHNOLOGIQUE DES FONTAINESCHEMIN DES FRANQUES38190 BERNIN), GAUDIN, Gweltaz (C/O SOITECPARC TECHNOLOGIQUE DES FONTAINESCHEMIN DES FRANQUES38190 BERNIN), HIKAVYY, Andriy (C/O SOITEC...