INTERNATIONAL PATENT: SILTRONIC AG FILES APPLICATION FOR "METHOD FOR DETERMINING THE SHAPE OF A WAFER MADE OF SEMICONDUCTOR MATERIAL AND METHOD FOR PRODUCING WAFERS MADE OF SEMICONDUCTOR MATERIAL"

GENEVA, Feb. 8 -- SILTRONIC AG (Einsteinstr. 172 Tower B / Blue Tower81677 Munchen) filed a patent application (PCT/EP2025/071121) for "METHOD FOR DETERMINING THE SHAPE OF A WAFER MADE OF SEMICONDUCTOR MATERIAL AND METHOD FOR PRODUCING WAFERS MADE OF SEMICONDUCTOR MATERIAL" on Jul 23, 2025. With publication no. WO/2026/027360, the details related to the patent application was published on Feb 05, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): WEISS, Robert (FrauenbuhlstraBe 4184543 Winhoring), GRAF, Daniel (Adalbert-Stifter Str. 1884561 Mehring), GUNTHER, Matthias (August-Ferdinand-Anacker-...