INTERNATIONAL PATENT: SILTRONIC AG FILES APPLICATION FOR "METHOD AND DEVICE FOR ADJUSTING A POSITION OF A NOTCH ON THE OUTER CIRCUMFERENCE OF A WAFER MADE OF A SEMICONDUCTOR MATERIAL"

GENEVA, May 18 -- SILTRONIC AG (Einsteinstr. 172 Tower B / Blue Tower81677 Munchen) filed a patent application (PCT/EP2025/078044) for "METHOD AND DEVICE FOR ADJUSTING A POSITION OF A NOTCH ON THE OUTER CIRCUMFERENCE OF A WAFER MADE OF A SEMICONDUCTOR MATERIAL" on Sep 30, 2025. With publication no. WO/2026/098850, the details related to the patent application was published on May 15, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): DAUB, Erich (Nikolaus-Lenau-Str. 16 a84547 Emmerting), ROSKA, Benedikt (Senftlstr. 981541 Munchen), ZIERER, Robert (Am Kronerstolln 8709599 Freiberg)

Abstract: Me...