International Patent: SILICON QUANTUM DOT MODIFYING COMPOSITION, MODIFIED SILICON QUANTUM DOTS, AND THICKENER SYSTEM, DRILLING FLUID, AND COMPLETION FLUID COMPRISING MODIFIED SILICON QUANTUM DOTS

GENEVA, June 26 -- CNPC BOHAI DRILLING ENGINEERING COMPANY LIMITED filed a patent application (CN2025/131031) for “SILICON QUANTUM DOT MODIFYING COMPOSITION, MODIFIED SILICON QUANTUM DOTS, AND THICKENER SYSTEM, DRILLING FLUID, AND COMPLETION FLUID COMPRISING MODIFIED SILICON QUANTUM DOTS”. With publication no. WO/2026/118741, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: C09K 8/03

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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