GENEVA, Oct. 5 -- SPP TECHNOLOGIES CO., LTD. filed a patent application (JP2026/011087) for “SILICON OXIDE FILM FORMATION METHOD, SILICON OXIDE FILM FORMATION APPARATUS, AND SILICON OXIDE FILM”. With publication no. WO/2026/204780, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: H10P 14/692
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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