INTERNATIONAL PATENT: SIEMENS INDUSTRY SOFTWARE INC. FILES APPLICATION FOR "KERNEL BASED MODELING OF EDGE INTERACTIONS IN THREE-DIMENSIONAL PHOTOMASK TRANSMISSION"

GENEVA, Oct. 20 -- SIEMENS INDUSTRY SOFTWARE INC. (5800 Granite Parkway, Suite 600Plano, Texas 75024) filed a patent application (PCT/US2024/024702) for "KERNEL BASED MODELING OF EDGE INTERACTIONS IN THREE-DIMENSIONAL PHOTOMASK TRANSMISSION" on Apr 16, 2024. With publication no. WO/2025/216744, the details related to the patent application was published on Oct 16, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): CLIFFORD, Christopher (1827 Elm StreetAlameda, California 94501), RAGHURAM, Nikhil (12663 Sun Valley CourtSaratoga, California 95070)

Abstract: Methods for use in integrated circuit ...