INTERNATIONAL PATENT: SHISEIDO COMPANY, LTD., 株式会社 資生堂 FILES APPLICATION FOR "COMPOSITION CONTAINING SILOXANE BOND-CONTAINING POLYMER COMPOUND HAVING HOST GROUP AND/OR GUEST GROUP"

GENEVA, May 11 -- SHISEIDO COMPANY, LTD. (5-5, Ginza 7-chome, Chuo-ku, Tokyo1040061), 株式会社　資生堂 (東京都中央区銀座７－５－５) filed a patent application (PCT/JP2025/037951) for "COMPOSITION CONTAINING SILOXANE BOND-CONTAINING POLYMER COMPOUND HAVING HOST GROUP AND/OR GUEST GROUP" on Oct 29, 2025. With publication no. WO/2026/094947, the details related to the patent application was published on May 07, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): MATSUKURA, T...