GENEVA, Dec. 22 -- SHIN-ETSU HANDOTAI CO., LTD. (2-1, Ohtemachi 2-chome, Chiyoda-ku, Tokyo1000004), 信越半導体株式会社 (東京都千代田区大手町二丁目２番１号) filed a patent application (PCT/JP2025/018245) for "SELECTIVE ETCHING LIQUID AND METHOD FOR EVALUATING SIGE SUBSTRATE" on May 20, 2025. With publication no. WO/2025/258341, the details related to the patent application was published on Dec 18, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Invento...