GENEVA, Feb. 23 -- SHIN-ETSU CHEMICAL CO., LTD. (4-1, Marunouchi 1-chome, Chiyoda-ku, Tokyo1000005), 信越化学工業株式会社 (東京都千代田区丸の内一丁目４番１号) filed a patent application (PCT/JP2025/027720) for "SILICON CARBIDE EPITAXIAL GROWTH-USE SUBSTRATE, METHOD FOR MANUFACTURING SAME, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE" on Aug 05, 2025. With publication no. WO/2026/038498, the details related to the patent application was published on Feb 19, 2026.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is ...