GENEVA, Nov. 25 -- SHIN-ETSU CHEMICAL CO., LTD. (4-1, Marunouchi 1-chome, Chiyoda-ku, Tokyo1000005), 信越化学工業株式会社 (東京都千代田区丸の内一丁目４番１号) filed a patent application (PCT/JP2025/017373) for "METHOD FOR PRODUCING POLYMER, METHOD FOR PRODUCING CHEMICALLY AMPLIFIED RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER, AND CHEMICALLY AMPLIFIED RESIST COMPOSITION" on May 13, 2025. With publication no. WO/2025/239351, the details related to the patent application was published on Nov 20, 2025.
Notably, the patent application was submitted under the Internat...