INTERNATIONAL PATENT: SHANGHAI JIYI TECHNOLOGY CO., LTD, 上海稷以科技有限公司 FILES APPLICATION FOR "PLASMA DEVICE AND PLASMA DENSITY REGULATION METHOD"

GENEVA, May 3 -- SHANGHAI JIYI TECHNOLOGY CO., LTD (Room 4026, Building E, No. 555 Dongchuan RoadMinhang District, Shanghai 200241), 上海稷以科技有限公司 (中国上海市闵行区东川路555号戊楼4026室) filed a patent application (PCT/CN2025/115583) for "PLASMA DEVICE AND PLASMA DENSITY REGULATION METHOD" on Aug 19, 2025. With publication no. WO/2026/086384, the details related to the patent application was published on Apr 30, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization...