International Patent: SEMICONDUCTOR DEVICE FORMATION SUBSTRATE AND PRODUCTION METHOD THEREFOR, AND SEMICONDUCTOR DEVICE

GENEVA, Aug. 14 -- JAPAN DISPLAY INC. filed a patent application (JP2025/041240) for “SEMICONDUCTOR DEVICE FORMATION SUBSTRATE AND PRODUCTION METHOD THEREFOR, AND SEMICONDUCTOR DEVICE”. With publication no. WO/2026/167962, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: C30B 29/38

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Disclaimer: Curated by HT Syndication....