International Patent: SELECTIVE ETCH OF SACRIFICIAL LIGHT-ABSORBING MATERIAL

GENEVA, Sept. 7 -- LAM RESEARCH CORPORATION filed a patent application (US2026/016519) for “SELECTIVE ETCH OF SACRIFICIAL LIGHT-ABSORBING MATERIAL”. With publication no. WO/2026/183138, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: H10P 50/28

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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