International Patent: SELECTIVE DEPOSITION AGENT, METHOD FOR FORMING SELECTIVE THIN FILM INCLUDING SAME, SEMICONDUCTOR SUBSTRATE, AND SEMICONDUCTOR DEVICE

GENEVA, July 1 -- SOULBRAIN CO., LTD. filed a patent application (KR2025/021486) for “SELECTIVE DEPOSITION AGENT, METHOD FOR FORMING SELECTIVE THIN FILM INCLUDING SAME, SEMICONDUCTOR SUBSTRATE, AND SEMICONDUCTOR DEVICE”. With publication no. WO/2026/127693, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: C23C 16/04

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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