INTERNATIONAL PATENT: SAMSUNG SDI CO., LTD., 삼성에스디아이 주식회사 FILES APPLICATION FOR "COMPOSITION FOR SEMICONDUCTOR PHOTORESIST AND PATTERN FORMATION METHOD USING SAME"

GENEVA, Jan. 6 -- SAMSUNG SDI CO., LTD. (150-20 Gongse-ro, Giheung-gu,Yongin-si,Gyeonggi-do 17084), 삼성에스디아이 주식회사 (경기도용인시기흥구 공세로 150-20) filed a patent application (PCT/KR2024/096697) for "COMPOSITION FOR SEMICONDUCTOR PHOTORESIST, AND PATTERN FORMATION METHOD USING SAME" on Dec 11, 2024. With publication no. WO/2026/005162, the details related to the patent application was published on Jan 02, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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