INTERNATIONAL PATENT: SALD IP B.V. FILES APPLICATION FOR "A METHOD AND APPARATUS FOR ATOMIC LAYER DEPOSITION ON A SUBSTRATE"

GENEVA, Dec. 2 -- SALD IP B.V. (Hastelweg 2575652 CV Eindhoven) filed a patent application (PCT/NL2025/050239) for "A METHOD AND APPARATUS FOR ATOMIC LAYER DEPOSITION ON A SUBSTRATE" on May 22, 2025. With publication no. WO/2025/244530, the details related to the patent application was published on Nov 27, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): DE VRIES, Hindrik Willem (c/o Hastelweg 2575652 CV Eindhoven), ARETZ, Ivo Franciscus Martinus (c/o Hastelweg 2575652 CV Eindhoven), BOLDING, Jons (c/o Hastelweg 2575652 CV Eindhoven), SOUREN, Floor Maria Martin (c/o Hastelweg 2575652 CV Eindh...