GENEVA, Oct. 5 -- SMT CO.,LTD. filed a patent application (KR2025/003904) for “ROTARY WAFER HEATING SYSTEM”. With publication no. WO/2026/205613, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: H01L 21/67
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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