International Patent: RHENIUM-BASED ATOMIC LAYER DEPOSITION PROCESS FOR DETECTOR DEVICE MANUFACTURE

GENEVA, June 24 -- INCOM, INC. filed a patent application (US2025/056524) for “RHENIUM-BASED ATOMIC LAYER DEPOSITION PROCESS FOR DETECTOR DEVICE MANUFACTURE”. With publication no. WO/2026/117449, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: C23C 16/40

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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